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题名: Preparation of Orthorhombic WO3 Thin Films and Their Crystal Quality-Dependent Dye Photodegradation Ability
作者: Yuan-Chang Liang
贡献者: 國立臺灣海洋大學:材料工程研究所
关键词: sputtering
crystal quality
photoactivated properties
日期: 2019-02
上传时间: 2019-06-21T06:01:43Z
出版者: Coatings
摘要: Abstract: Direct current (DC) magnetron sputtering deposited WO3films with different crystallinequalities were synthesized by postannealing at various temperatures. The in-situ DC sputteringdeposited WO3thin film at 375◦C exhibited an amorphous structure. The as-grown WO3filmswere crystallized after annealing at temperatures of 400–600◦C in ambient air. Structural analysesrevealed that the crystalline WO3films have an orthorhombic structure. Moreover, the crystallitesize of the WO3film exhibited an explosive coarsening behavior at an annealing temperature above600◦C. The density of oxygen vacancy of the WO3films was substantially lowered through ahigh temperature annealing procedure. The optical bandgap values of the WO3films are highlyassociated with the degree of crystalline quality. The annealing-induced variation of microstructures,crystallinity, and bandgap of the amorphous WO3thin films explained the various photoactivatedproperties of the films in this study
關聯: 9(2) pp.90
显示于类别:[材料工程研究所] 期刊論文


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