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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/52284

Title: Preparation of Orthorhombic WO3 Thin Films and Their Crystal Quality-Dependent Dye Photodegradation Ability
Authors: Yuan-Chang Liang
C.W.Chang
Contributors: 國立臺灣海洋大學:材料工程研究所
Keywords: sputtering
annealing
crystal quality
photoactivated properties
Date: 2019-02
Issue Date: 2019-06-21T06:01:43Z
Publisher: Coatings
Abstract: Abstract: Direct current (DC) magnetron sputtering deposited WO3films with different crystallinequalities were synthesized by postannealing at various temperatures. The in-situ DC sputteringdeposited WO3thin film at 375◦C exhibited an amorphous structure. The as-grown WO3filmswere crystallized after annealing at temperatures of 400–600◦C in ambient air. Structural analysesrevealed that the crystalline WO3films have an orthorhombic structure. Moreover, the crystallitesize of the WO3film exhibited an explosive coarsening behavior at an annealing temperature above600◦C. The density of oxygen vacancy of the WO3films was substantially lowered through ahigh temperature annealing procedure. The optical bandgap values of the WO3films are highlyassociated with the degree of crystalline quality. The annealing-induced variation of microstructures,crystallinity, and bandgap of the amorphous WO3thin films explained the various photoactivatedproperties of the films in this study
Relation: 9(2) pp.90
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/52284
Appears in Collections:[材料工程研究所] 期刊論文

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