English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26988/38789
Visitors : 2323715      Online Users : 61
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/52158

Title: 氮化鈦矽薄膜的機械性質與抗氧化特性研究
Mechanical Properties and Oxidation Resistance of Ti–Si–N Coatings
Authors: Lin, Nai-Yuan
Contributors: NTOU:Institute of Materials Engineering
Keywords: 熱處理;機械性質;抗氧化;穿透式電子顯微鏡;X射線光電子能譜儀
Annealing;Mechanical properties;Oxidation;Transmission electron microscopy;X-ray photoelectron spectroscopy
Date: 2018
Issue Date: 2019-05-23T06:19:32Z
Abstract: 本實驗使用反應式直流磁控濺鍍系統製備Ti–Si–N薄膜,固定鈦靶功率改變矽靶功率,Ti47Si3N50、Ti41Si7N52、Ti35Si13N52和Ti31Si16N53薄膜呈現結晶的結構,而Ti27Si20N53和Ti24Si23N53薄膜呈現奈米晶的結構。Ti31Si16N53薄膜呈現出最大的機械性質19.2 GPa,楊氏係數為247GPa。為了評估Ti–Si–N薄膜的抗氧化性質,在1%O2–99%Ar的氣氛中熱退火,薄膜表現出良好的抗氧化性,高矽含量的薄膜,在經過一段時間的退火過程中形成SiO2的氧化物層,進一步的退火,XRD的強度減弱,50小時之後在XRD上觀察不到。為了模擬玻璃模造的應用在15–ppm O2–N2的氣體環境中熱循環,溫度變化控制在270–600 ℃且在600 ℃±10 ℃維持一分鐘,薄膜可以抵抗這樣連續的溫度變化超過500 cycles。在本研究中,應用穿透式電子顯微鏡和X射線光電子能譜分析了退火Ti-Si-N薄膜的奈米結構和結合特性的演變。結果呈現矽含量越多明顯提高抗氧化性質和熱穩定性,高矽含量的樣品可承受50小時熱處理。樣品也可承受15–ppm O2–N2¬的熱循環,但作為玻璃接觸的應用就不合適了。 關鍵字:熱處理、機械性質、抗氧化、穿透式電子顯微鏡、X射線光電子能譜儀
Ti–Si–N coatings were fabricated using reactive direct current magnetron cosputtering. Fixed titanium target power and changes silicon power. The Ti–Si–N coatings with Si contents of 3–16 at. % exhibited crystalline, whereas the Ti–Si–N coatings with Si contents of 20 and 23 at. % were near-amorphous. The Ti31Si16N53 coatings exhibited maximum mechanical property levels, including a nanoindentation hardness of 19.2 GPa and a Young’s modulus of 247 GPa. The oxidation resistance of the Ti–Si–N coatings was evaluated through annealing at 600 ℃ in a 1%O2–99%Ar atmosphere. The Ti–Si–N coatings showed good oxidation resistance. High silicon content coatings. Rutile TiO2 formed in the early stage of oxidation, however, the reflection intensity of X-ray diffraction decreased in further annealing. To explore the stability in glass molding procrsses, thermal cycles annealing, involving annealing at 270 ℃ to 600 ℃ and maintaining at 600 ℃ ± 10 ℃ hold for 1 min. The coatings withstands continuous temperature changes over 500 cycles. In this study, transmission electron microscopy and X-ray photoelectron spectroscopy were applied to investigate the evolution of nanostructure and bonding characteristics of the annealed Ti–Si–N coatings. Keywords: Annealing, Mechanical properties, Oxidation, Transmission electron microscopy; X-ray photoelectron spectroscopy
URI: http://ethesys.lib.ntou.edu.tw/cgi-bin/gs32/gsweb.cgi?o=dstdcdr&s=G0010455017.id
Appears in Collections:[材料工程研究所] 博碩士論文

Files in This Item:

File SizeFormat

All items in NTOUR are protected by copyright, with all rights reserved.


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback