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Title: Fabrication of vertical graphitic nanopartitions for anti-reflection function of silicon solar cells
Authors: Jeff Tsung-Hui Tsai
Wen-Ching Shih
Jian-Min Jeng
Yen-Tang Chiao
Chin-Tze Hwang
Jyi-Tsong Lo
Contributors: 國立臺灣海洋大學光電科學研究所
Keywords: sputtering
amorphous carbon
optical properties characterisation
Date: 2012-02
Issue Date: 2019-01-11T01:42:30Z
Publisher: Nanoscience Methods
Abstract: Abstract: Vertical standing, thin graphitic nano-partitions were fabricated on quartz and silicon substrates using a reactive plasma sputtering system. These nano-sized partitions act as light reflectors, enhancing the solar absorption of omni-directional incident light. The structure of nano-partitions doubles the output power of the solar cell when illuminated from a 30° to 150° angle of incidence. Such nano-partitions also enhance solar efficiency when reflected light is used to produce more photon absorption. Measurement of reflectance has shown a minimum of 0.49% at a wavelength of 580 nm when nano-partitions are used. The average reflectance of the entire visible regime is 0.85%, which is equivalent to the conventional multi-layer anti-reflection coatings. We also found that this nano-partition system has superior anti-reflection efficiency in a UV regime. This 3D anti-reflection structure provides a promising route to the fabrication of high-efficiency solar cells.
Relation: 1(1) pp.50-55
Appears in Collections:[Institute of Optoelectronic Sciences] Periodical Articles

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