English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26987/38787
Visitors : 2294193      Online Users : 44
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51822

Title: Rapid cell-patterning and microfluidic chip fabrication by crack-free CO2 laser ablation on glass
Authors: Meng-Hua Yen
Ji-Yen Cheng
Cheng-Wey Wei
Yung-Chuan Chuang
Tai-Horng Young
Contributors: 國立臺灣海洋大學:機械與機電工程學系
Date: 2006-04
Issue Date: 2018-12-25T07:44:24Z
Publisher: J. Micromech. Microeng.
Abstract: Abstract: This paper uses a widely available CO2 laser scriber (λ = 10.6 µm) to perform the direct-writing ablation of quartz, borofloat and pyrex substrates for the development of microfluidic chips and cell chips. The surface quality of the ablated microchannels and the presence of debris and distortion are examined by scanning electron microscopy, atomic force microscopy and surface profile measurement techniques. The developed laser ablation system provides a versatile and economic approach for the fabrication of glass microfluidic chips with crack-free structures. In the laser writing process, the desired microfluidic patterns are designed using commercial computer software and are then transferred to the laser scriber to ablate the trenches. This process eliminates the requirement for corrosive chemicals and photomasks, and hence the overall microchip development time is limited to less than 24 h. Additionally, since the laser writing process is not limited by the dimensions of a photomask, the microchannels can be written over a large substrate area. The machining capability and versatility of the laser writing system are demonstrated through its application to the fabrication of a borofloat microfluidic chip and the writing of a series of asymmetric trenches in a microwell array. It is shown that the minimum attainable trench width is 95 µm and that the maximum trench depth is 225 µm. The system provides an economic and powerful means of rapid glass microfluidic chip development. A rapid cell-patterning method based on this method is also demonstrated.
Relation: 16(7)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51822
Appears in Collections:[機械與機電工程學系] 期刊論文

Files in This Item:

File Description SizeFormat
index.html0KbHTML6View/Open


All items in NTOUR are protected by copyright, with all rights reserved.

 


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback