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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51747

Title: Pulsed Magnetron Sputtered Low Temperature Indium Tin Oxide (ITO) Films for Flat Panel Display Applications
Authors: William J. Lee
Yean-Kuen Fang
Jyh-Jier Ho
Chin-Ying Chen
Rung-Ywan Tsai
Daoyang Huang
Fang C. Ho
H. W. Chou
C. C. Chen
Contributors: 國立臺灣海洋大學:電機工程學系
Keywords: Indium tin oxide
DC-pulsed magnetron sputtering
electrical and optical properties
Date: 2002-02
Issue Date: 2018-12-21T07:11:00Z
Publisher: Journal of Electronic Materials
Abstract: Abstract: In this paper, indium tin oxide (ITO) thin films were prepared by unipolar and bipolar direct current (DC)-pulsed magnetron sputtering in a mixture of argon and oxygen onto unheated glass substrates. The target of ITO with 10 wt.% tin is used. The influences of polar modes (unipolar and bipolar); output frequencies (0 to 33 kHz); and times and off times on the optical, electrical, and structural properties of ITO films are investigated. The correlations between the deposition parameters and the film properties are discussed. It is found that the resistivity with 10−3 Θ-cm and transmittance with ≥90% of amorphous ITO films can be prepared by the reactive bipolar DC-pulsed sputtering with t on − between 45 µs and 85 µs (i.e., t on − /t on + is 9–17), and t on + , t off − and t off + are constant at 5 µs, 10 µs, and 5 µs, respectively. An optimal condition, based on the polar mode and frequency of reactive-pulsed sputtering, for obtaining the high transmittance and low resistivity of ITO films is suggested.
Relation: 31(2) pp.129-135
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51747
Appears in Collections:[電機工程學系] 期刊論文

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