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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51744

Title: Optimizing Indium Tin Oxide Thin Films with Bipolar dc-pulsed Magnetron Sputtering for electrochromic Device Applications
Authors: W. J. Lee
Y. K. Fang
J.-J. Ho
C.-Y. Chen
S.-F. Chen
R.-Y. Tsai
D. Huang
F. C. Ho
Contributors: 國立臺灣海洋大學:電機工程學系
Keywords: Surface Roughness
Glass Substrate
Oxide Thin Film
Deposition Parameter
Film Property
Date: 2002-12
Issue Date: 2018-12-21T06:55:07Z
Publisher: Journal of Materials Science: Materials in Electronics
Abstract: Abstract: In this paper, indium tin oxide (ITO) films were prepared by bipolar d.c.-pulsed magnetron sputtering in a mixture of argon and oxygen onto unheated glass substrates. A target of ITO with 10 weight percent (wt %) tin was used. The influences of ratios of t−on/t+on (negative pulse-on time/positive pulse-on time) on the optical, electrical, and structural properties of ITO films have been investigated. The correlations between the deposition parameters and the film properties were discussed. An optimal condition based on reactive bipolar d.c.-pulsed sputtering for obtaining high transmittance, low resistivity, and low surface roughness of ITO films with high deposition rate is suggested. Then, ITO films grown at room temperature by bipolar d.c.-pulsed sputtering were used to form electrochromic devices of WO3. Better electrochromic performances were found in comparison to those measured with commercially available ITO films on glass substrates.
Relation: 13(12) pp.751-756
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51744
Appears in Collections:[電機工程學系] 期刊論文

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