National Taiwan Ocean University Institutional Repository:Item 987654321/51360
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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51360

Title: Mechanical properties and oxidation behavior of multilayered Hf–Si–N coatings
Authors: Li-Chun Chang
Bo-Wei Liu
Yung-I Chen
Contributors: 國立臺灣海洋大學:光電與材料科技學士學位學程(學系)
Date: 2018-10
Issue Date: 2018-11-23T07:19:27Z
Publisher: Coatings
Abstract: Abstract: Monolithic Hf–Si–N coatings and multilayered Hf–Si–N coatings with cyclical gradient concentration were fabricated using reactive direct current magnetron cosputtering. The structure of the Hf–Si–N coatings varied from a crystalline HfN phase, to a mixture of HfN and amorphous phases and to an amorphous phase with continuously increasing the Si content. The multilayered Hf48Si3N49 coatings exhibited a mixture of face-centered cubic and near-amorphous phases with a maximal hardness of 22.5 GPa, a Young’s modulus of 244 GPa and a residual stress of −1.5 GPa. The crystalline phase-dominant coatings exhibited a linear relationship between the hardness and compressive residual stress, whereas the amorphous phase-dominant coatings exhibited a low hardness level of 15–16 GPa; this hardness is close to that of Si3N4. Various oxides were formed after annealing of the Hf–Si–N coatings at 600 °C in a 1% O2–99% Ar atmosphere. Monoclinic HfO2 formed after Hf54N46 annealing and amorphous oxide formed for the oxidation-resistant Hf32Si19N49 coatings. The oxidation behavior with respect to the Si content was investigated by using transmission electron microscopy and X-ray photoelectron spectroscopy.
Relation: 8(10) pp.354
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/51360
Appears in Collections:[Institute of Optoelectronic Sciences] Periodical Articles

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