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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/50809

Title: Diffusion behavior of the spin valve structure
Authors: Rong-Tan Huang
Fu-Rong Chen
Ji-Jung Kai
I-Fei Tsu
Sining Mao
W. Kai
Contributors: 國立臺灣海洋大學:材料工程研究所
Date: 2001-01
Issue Date: 2018-10-25T03:47:59Z
Publisher: Journal of Applied Physics
Abstract: Abstract: NiMn/NiFe/Co/Cu/Co/NiFe/seed layer (sample No. 1) and NiFe/CoFe/Cu/CoFe/Ru/CoFe/NiFe/NiMn/Seed layer (sample No. 2), are investigated by using high resolution analytical transmission electron microscopy and an imaging filter. The compositional analysis demonstrated that the diffusions of the Mn and Ni into the Cu/Co bilayer are only observed in sample No. 1. This result indicated that the Ru layer in sample No. 2 might not only act as the spacer of the synthetic antiferromagnet but also behaves as a good diffusion barrier for the Ni and Mn element in the spin valve structure. The diffusion coefficients of constituent elements are simply investigated using the Matano–Boltzmann method. The diffusion mechanisms of Cu in Co layer and Co in Cu layer were primarily dominated by the grain boundary.
Relation: 89
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/50809
Appears in Collections:[材料工程研究所] 期刊論文

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