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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48193

Title: Mechanical properties and oxidation resistance of reactively sputtered Ta1 − xZrxNy thin films
Authors: Li-Chun Chang
Ching-Yen Chang
Yung-I Chen
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Keywords: Annealing
Glass molding
Mechanical properties
Oxidation
TaZrN
Date: 2015-10
Issue Date: 2018-08-16T01:01:47Z
Publisher: Surface & Coatings Technology
Abstract: Abstract: Ta1 − xZrxNy coatings were fabricated using reactive direct-current magnetron cosputtering on silicon and cemented carbide substrates. The oxidation resistance of the Ta1 − xZrxNy coatings was evaluated by annealing the samples in a 15-ppm O2–N2 atmosphere at 600 °C. The variations in crystalline structure, mechanical properties, and surface roughness values after annealing were investigated. One commercial moldable glass material, a SiO2–B2O3–BaO-based glass, was used to evaluate the chemical inertness of Ta1 − xZrxNy coatings, applied as protective coatings in glass molding processes. Thermal cycling annealing at 270 and 600 °C, with the temperature strictly maintained at 600 ± 10 °C for 1 min/cycle, was conducted in a quartz tube furnace to simulate a glass molding process in a continuous flow of 15 ppm O2–N2. Up to 500 thermal cycling annealing tests were conducted for the glass and coating assemblies.
Relation: 280 pp.27-36
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48193
Appears in Collections:[光電科學研究所] 期刊論文

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