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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48190

Title: Oxidation behavior and mechanical properties of laminated Hf–Ta coatings
Authors: Yung-I Chen
Yu-Ren Huang
Li-Chun Chang
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Keywords: Annealing
Hf–Ta
Internal oxidation
Nanolaminated structure
Date: 2015-11
Issue Date: 2018-08-15T08:54:51Z
Publisher: Applied Surface Science
Abstract: Abstract: This study explores the internal oxidation of laminated Hf–Ta coatings with a cyclically gradient chemical concentration distribution along the growth direction. The oxidation behavior was examined by annealing the coatings at 400–600 °C in a 15 ppm O2–N2 atmosphere for 30 min. The variations in crystalline structure, nanohardness, chemical states, and chemical composition profiles in depth after various annealing conditions were investigated. The results indicate that all the Hf–Ta coatings maintain a laminated structure after annealing at 400–600 °C. Internal oxidation conducts during 500 and 600 °C annealing, but part of the outmost layers exhibits complex oxides after annealing at 600 °C. The nanohardness of annealed Hf–Ta coatings related to the formation of HfO2, Hf6Ta2O17, and amorphous Ta-oxide were studied.
Relation: 354 pp.179-186
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48190
Appears in Collections:[光電科學研究所] 期刊論文

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