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Title: Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition
Authors: Li-Chun Chang
Ching-Yen Chang
Yung-I Chen
Hsuan-Ling Kao
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Date: 2016-03
Issue Date: 2018-08-15T08:46:14Z
Publisher: J. Vac. Sci. Technol. A
Abstract: Abstract: ZrNx thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2–N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNx thin films were characterized by a high nanohardness of 26–27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNx thin films declined after they were annealed owing to the formation of ZrO2 scales.
Relation: 34(2)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48189
Appears in Collections:[光電科學研究所] 期刊論文

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