English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26988/38789
Visitors : 2344855      Online Users : 34
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48189

Title: Mechanical properties and oxidation behavior of ZrNx thin films fabricated through high-power impulse magnetron sputtering deposition
Authors: Li-Chun Chang
Ching-Yen Chang
Yung-I Chen
Hsuan-Ling Kao
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Date: 2016-03
Issue Date: 2018-08-15T08:46:14Z
Publisher: J. Vac. Sci. Technol. A
Abstract: Abstract: ZrNx thin films were deposited on silicon substrates using novel high-power impulse magnetron sputtering. The films were annealed at 600 °C in an atmosphere of 15 ppm O2–N2, and their performance as a protective hard coating on glass molding dies was evaluated. The as-deposited ZrNx thin films were characterized by a high nanohardness of 26–27 GPa and low surface roughness of approximately 0.5 nm. However, the mechanical properties of the ZrNx thin films declined after they were annealed owing to the formation of ZrO2 scales.
Relation: 34(2)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48189
Appears in Collections:[光電科學研究所] 期刊論文

Files in This Item:

File Description SizeFormat
index.html0KbHTML23View/Open


All items in NTOUR are protected by copyright, with all rights reserved.

 


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback