English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26988/38789
Visitors : 2314605      Online Users : 25
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48188

Title: Internal oxidation of laminated Hf–Ru coatings
Authors: Yung-I Chen
Yu-Ren Huang
Li-Chun Chang
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Date: 2016-03
Issue Date: 2018-08-15T08:38:53Z
Publisher: Journal of Vacuum Science & Technology A
Abstract: Abstract: This study explored the internal oxidation of laminated Hf–Ru coatings by using cyclical gradient chemical concentration distribution along the growth direction. Hf-rich, near-equiatomic, and Ru-rich Hf–Ru coatings were prepared using direct-current magnetron cosputtering. Oxidation was examined by annealing the coatings at 500 and 600 °C in a 1% O2–99% Ar atmosphere for 30 min. The results indicated that internally oxidized laminated Hf–Ru coatings formed after annealing at 600 °C. Hf preferentially oxidized and formed monoclinic HfO2. The Ru-rich Hf0.11Ru0.89 coatings exhibited a higher oxidation resistance and superior mechanical properties.
Relation: 34(2)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48188
Appears in Collections:[光電科學研究所] 期刊論文

Files in This Item:

File Description SizeFormat

All items in NTOUR are protected by copyright, with all rights reserved.


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback