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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48185

Title: Oxidation behavior of Ru–Al multilayer coatings
Authors: Yung-I Chen
Zhi-Ting Zheng
Wu Kai
Yu-Ren Huang
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Keywords: Auger electron spectroscopy
Multilayer coatings
X-ray photoelectron spectroscopy
Date: 2017-06
Issue Date: 2018-08-15T08:10:28Z
Publisher: Applied Surface Science
Abstract: Abstract: Ru0.63Al0.37 coatings were deposited through a cyclical gradient concentration deposition at 400 °C with a substrate-holder rotation speed of 1 rpm by direct current magnetron cosputtering. Scanning electron microscopy revealed that the as-deposited coatings exhibited a multilayer structure along with the columnar structure. The oxidation behavior of the Ru0.63Al0.37 coatings was examined through X-ray diffraction, Auger electron spectroscopy, transmission electron microscopy, and X-ray photoelectron spectroscopy. Oxidation kinetics was measured using a thermogravimetric analyzer. Internal oxidation was observed for Ru0.63Al0.37 coatings annealed in a 1% O2–99% Ar atmosphere at 400–600 °C accompanied with activation energies of 72–84 kJ/mol. By contrast, external oxidation was observed after annealing at 700–800 °C, resulting in the formation of a continuous alumina scale consisting of crystalline δ-Al2O3 domains, which can be attributable to the outward diffusion of Al.
Relation: 406(1) pp.1-7
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48185
Appears in Collections:[光電科學研究所] 期刊論文

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