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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48181

Title: Thermal stability of Ru–Al multilayered thin films on Inconel 617
Authors: Yung-I Chen
Zhi-Ting Zheng
Jia-Wei Jhang
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Keywords: multilayer
oxidation
RuAl
thermal stability
Date: 2018-07
Issue Date: 2018-08-15T07:30:58Z
Publisher: Metals
Abstract: Abstract: Ru-riched and equiatomic Ru–Al multilayered thin films were fabricated on Si and Inconel 617 substrates. These thin films exhibited a multilayered structure that is caused by stacking cyclical gradient concentration through cosputtering. X-ray diffraction analysis indicated that the as-deposited Ru–Al multilayers comprised Ru and RuAl phases. Oxidation that is caused by annealing atmospheres and elements diffused from substrates was investigated. The results indicated that the inward diffusion of O at 600 °C in a 1% O2–99% Ar atmosphere was restricted by the formation of an amorphous Al-oxide sublayer, and inward diffusion of O at 800 °C in air was limited by the formation of a crystalline Al2O3 scale. Additionally, the outward diffusion of elements from Inconel 617 penetrated the unoxidized parts of the 800 °C–annealed Ru–Al multilayers.
Relation: 8(7)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48181
Appears in Collections:[光電科學研究所] 期刊論文

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