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|Title: ||Mechanical properties of Zr–Si–N films fabricated through HiPIMS/RFMS co-sputtering|
|Authors: ||Li-Chun Chang|
|Issue Date: ||2018-08-15T07:23:41Z
|Abstract: ||Abstract: Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr–Si–N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films’ hardness and Young’s modulus exhibited an evident relationship to their compressive residual stresses. The films with 2–6 at.% Si exhibited high hardness of 33–34 GPa and high Young’s moduli of 346–373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa.|
|Appears in Collections:||[光電科學研究所] 期刊論文|
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