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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48180

Title: Mechanical properties of Zr–Si–N films fabricated through HiPIMS/RFMS co-sputtering
Authors: Li-Chun Chang
Yu-Zhe Zheng
Yung-I Chen
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Date: 2018-08
Issue Date: 2018-08-15T07:23:41Z
Publisher: Coatings
Abstract: Abstract: Zr–Si–N films were fabricated through the co-deposition of high-power impulse magnetron sputtering (HiPIMS) and radio-frequency magnetron sputtering (RFMS). The mechanical properties of the films fabricated using various nitrogen flow rates and radio-frequency powers were investigated. The HiPIMS/RFMS co-sputtered Zr–Si–N films were under-stoichiometric. These films with Si content of less than 9 at.%, and N content of less than 43 at.% displayed a face-centered cubic structure. The films’ hardness and Young’s modulus exhibited an evident relationship to their compressive residual stresses. The films with 2–6 at.% Si exhibited high hardness of 33–34 GPa and high Young’s moduli of 346–373 GPa, which was accompanied with compressive residual stresses from −4.4 to −5.0 GPa.
Relation: 8(8)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48180
Appears in Collections:[光電科學研究所] 期刊論文

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