English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26988/38789
Visitors : 2327535      Online Users : 47
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48179

Title: Mechanical properties, bonding characteristics, and oxidation behaviors of Nb–Si–N coatings
Authors: Yung-I Chen
Yu-Xiang Gao
Li-Chun Chang
Yi-En Ke
Bo-Wei Liu
Contributors: 國立臺灣海洋大學:光電與材料科技學系
Keywords: Mechanical properties
Nb-Si-N
Oxidation
X-ray photoelectron spectroscopy
Transmission electron microscopy
Date: 2018-09
Issue Date: 2018-08-15T07:05:16Z
Publisher: Surface and Coatings Technology
Abstract: Abstract: Nb–Si–N coatings with Si contents of 0–30 at% were fabricated through reactive direct current magnetron cosputtering. The processing parameters were various sputtering powers, substrate holder rotation speeds, and nitrogen flow ratio (N2/(N2 + Ar)). Three phase regions, namely face-centered cubic (f.c.c.) NaCl structure, X-ray amorphous, and nanocrystalline phases, were identified and related to the chemical compositions of the coatings. Low-Si-content (0–13 at%) and middle-N-content (39–45 at%) Nb–Si–N coatings exhibited an f.c.c. structure, high-Si-content (17–30 at%) and high-N-content (45–53 at%) Nb–Si–N coatings exhibited an X-ray amorphous structure, and low-Si-content (6 at%) and low-N-content (26–30 at%) Nb–Si–N coatings exhibited a nanocrystalline structure. Examining the bonding characteristics of the Nb–Si–N coatings by using X-ray photoelectron spectroscopy indicated that NbN tended to form preferentially and was followed by Si3N4, which is consistent with the laws of thermodynamics. The correlations between the mechanical properties, residual stresses, and structures of the Nb–Si–N coatings were investigated using nanoindentation, a curvature method, and X-ray diffraction. The oxidation behaviors of the Nb–Si–N coatings annealed in air at 400–600 °C were also examined.
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/48179
Appears in Collections:[光電科學研究所] 期刊論文

Files in This Item:

File Description SizeFormat
index.html0KbHTML47View/Open


All items in NTOUR are protected by copyright, with all rights reserved.

 


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback