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Title: Single-crystalline aluminum film for ultraviolet plasmonic nanolasers
Authors: S.-D. Lin
B.-T. Chou
Y.-H. Chou
Y.-M. Wu
Y.-C. Chung
W.-J. Hsueh
S.-W. Lin
T.-C. Lu
T.-R. Lin
Contributors: 國立臺灣海洋大學:光電科學研究所
Date: 2016-01
Issue Date: 2018-07-24T02:35:20Z
Publisher: Scientific Reports
Abstract: Abstract: Significant advances have been made in the development of plasmonic devices in the past decade. Plasmonic nanolasers, which display interesting properties, have come to play an important role in biomedicine, chemical sensors, information technology, and optical integrated circuits. However, nanoscale plasmonic devices, particularly those operating in the ultraviolet regime, are extremely sensitive to the metal and interface quality. Thus, these factors have a significant bearing on the development of ultraviolet plasmonic devices. Here, by addressing these material-related issues, we demonstrate a low-threshold, high-characteristic-temperature metal-oxide-semiconductor ZnO nanolaser that operates at room temperature. The template for the ZnO nanowires consists of a flat single-crystalline Al film grown by molecular beam epitaxy and an ultrasmooth Al2O3 spacer layer synthesized by atomic layer deposition. By effectively reducing the surface plasmon scattering and metal intrinsic absorption losses, the high-quality metal film and the sharp interfaces formed between the layers boost the device performance. This work should pave the way for the use of ultraviolet plasmonic nanolasers and related devices in a wider range of applications.
Appears in Collections:[Institute of Optoelectronic Sciences] Periodical Articles

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