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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47343

Title: E-beam lithography and electrodeposition fabrication of thick nanostructured devices
Authors: Y. Hwu
T. N. Lo
Y. T. Chen
C. W. Chiu
C. J. Liu
S. R. Wu
I. K. Lin
C. I. Su
W. D. Chang
Contributors: 國立臺灣海洋大學:光電科學研究所
Date: 2007-05
Issue Date: 2018-07-16T07:02:42Z
Abstract: Abstract: A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.
Relation: 40(10)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47343
Appears in Collections:[光電科學研究所] 期刊論文

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