English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26988/38789
Visitors : 2312601      Online Users : 24
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47343

Title: E-beam lithography and electrodeposition fabrication of thick nanostructured devices
Authors: Y. Hwu
T. N. Lo
Y. T. Chen
C. W. Chiu
C. J. Liu
S. R. Wu
I. K. Lin
C. I. Su
W. D. Chang
Contributors: 國立臺灣海洋大學:光電科學研究所
Date: 2007-05
Issue Date: 2018-07-16T07:02:42Z
Publisher: JOURNAL OF PHYSICS D-APPLIED PHYSICS
Abstract: Abstract: A nanofabrication approach based on advanced e-beam lithography and electrodeposition successfully produced high-resolution (≈40 nm line width) metal structures with high aspect ratio (>12) and high density. The combination of these characteristics is essential for hard-x-ray optical components such as zone plates, for x-ray lithography masks and for other devices.
Relation: 40(10)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47343
Appears in Collections:[光電科學研究所] 期刊論文

Files in This Item:

File Description SizeFormat
index.html0KbHTML22View/Open


All items in NTOUR are protected by copyright, with all rights reserved.

 


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback