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题名: Fabrication of High Aspect Ratio Fresnel Zone Plates by E-beam Lithography and Electroplating
作者: G. C. Yin, H
Y. T. Chen
T. N. Lo
C. W. Chiu
C. J. Liu
S. R. Wu
S. T. Jeng
C. C. Yang
J. Shiue
C. H. Chen
Y. Hwu
贡献者: 國立臺灣海洋大學:光電科學研究所
日期: 2008-07
上传时间: 2018-07-16T03:26:35Z
摘要: Abstract: The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.
關聯: 15(2)
显示于类别:[光電科學研究所] 期刊論文


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