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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47327

Title: Fabrication of High Aspect Ratio Fresnel Zone Plates by E-beam Lithography and Electroplating
Authors: G. C. Yin, H
Y. T. Chen
T. N. Lo
C. W. Chiu
C. J. Liu
S. R. Wu
S. T. Jeng
C. C. Yang
J. Shiue
C. H. Chen
Y. Hwu
Contributors: 國立臺灣海洋大學:光電科學研究所
Date: 2008-07
Issue Date: 2018-07-16T03:26:35Z
Publisher: JOURNAL OF SYNCHROTRON RADIATION
Abstract: Abstract: The fabrication of gold Fresnel zone plates, by a combination of e-beam lithography and electrodeposition, with a 30 nm outermost zone width and a 450 nm-thick structure is described. The e-beam lithography process was implemented with a careful evaluation of applied dosage, tests of different bake-out temperatures and durations for the photoresist, and the use of a developer without methylisobutylketone. Electrodeposition with a pulsed current mode and with a specially designed apparatus produced the desired high-aspect-ratio nanostructures. The fabricated zone plates were examined by electron microscopy and their performances were assessed using a transmission X-ray microscope. The results specifically demonstrated an image resolution of 40 nm.
Relation: 15(2)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47327
Appears in Collections:[光電科學研究所] 期刊論文

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