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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47323

Title: Full-field Hard X-Ray Microscopy below 30 Nanometers: a Challenging Nanofabrication Achievement
Authors: Giorgio Margaritondo
Yu-Tung Chen
Tsung-Nan Lo
Yong S. Chu
Jaemock Yi
Chi-Jen Liu
Jun-Yue Wang
Cheng-Liang Wang
Chen-Wei Chiu
Tzu-En Hua
Yeukuang Hwu
Qun Shen
Gung-Chian Yin
Keng S. Liang
Hong-Ming Lin
Jung-Ho Je
Contributors: 國立臺灣海洋大學:光電科學研究所
Date: 2008-08
Issue Date: 2018-07-16T03:12:00Z
Publisher: NANOTECHNOLOGY
Abstract: Abstract: The fabrication of devices to focus hard x-rays is one of the most difficult—and important—challenges in nanotechnology. Here we show that Fresnel zone plates combining 30 nm external zones and a high aspect ratio finally bring hard x-ray microscopy beyond the 30 nm Rayleigh spatial resolution level and measurable spatial frequencies down to 20–23 nm feature size. After presenting the overall nanofabrication process and the characterization test results, we discuss the potential research impact of these resolution levels.
Relation: 19(39)
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/47323
Appears in Collections:[光電科學研究所] 期刊論文

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