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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/41859

Title: Oxidation resistance and mechanical properties of Ta-Al-N coatings
Authors: Yung-I Chen;un-Hsin Lin;Chau-Chang Chou
Contributors: 國立臺灣海洋大學:機械與機電工程學系
Keywords: Annealing;Mechanical properties;Oxidation;Ta–Al–N
Date: 2015
Issue Date: 2017-04-07T01:38:36Z
Publisher: ACT 2015 International Thin Films Conference
Abstract: Abstract:Ta–Al–N coatings were prepared using reactive magnetron cosputtering on silicon substrates. The coatings with a high Ta content exhibited a face-centered-cubic structure, whereas the coating with a high Al content exhibited a near-amorphous phase. To determine the oxidation resistance of the Ta–Al–N coatings, annealing treatments were conducted in air at 600–800 °C. Adding Al into a TaN structure increased the oxidation resistance to endure 8-h annealing at 600 °C. Moreover, the Ta35Al15N50 coating exhibited a superior oxidation resistance at 700 °C for 4 h. The material characteristics of the annealed Ta–Al–N coatings were examined through Auger electron spectroscopy and transmission electron microscopy and by using a nanoindentation tester.
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/41859
Appears in Collections:[機械與機電工程學系] 演講及研討會

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