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题名: Above-room-temperature photoluminescence from a strain-compensated Ge/Si0.15Ge0.85 multiple-quantum-well structure
作者: P. H. Wu;D. Dumcenco;Y. S. Huang;H. P. Hsu;C. H. Lai;T. Y. Lin;D. Chrastina;G. Isella;E. Gatti;K. K. Tiong
贡献者: 國立臺灣海洋大學:光電科學研究所
日期: 2012
上传时间: 2017-02-14T08:38:01Z
出版者: Applied Physics Letters
摘要: Abstract: Photoluminescence (PL) of a strain-compensated Ge/Si0.15Ge0.85 multiple-quantum-well (MQW) structure was studied above room temperature, in the range of 300–440 K. Both direct and indirect radiative recombination PL features were observed. The relative intensity of direct to indirect recombination markedly increases with the increase of temperature. The enhancement of PL from direct recombination above RT has been attributed to the thermal excitation of carriers from L-type to Γ-type confined states. This extends the potential applicability of Ge/SiGe MQW as light emitters on a Si-based platform and is favorable for applications in metal-oxide-semiconductor integrated circuits which normally operate above RT.
關聯: 100
URI: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/41362
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