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|Title: ||Thermal stability of CrTaN hard coatings prepared using biased direct current sputter deposition|
|Contributors: ||NTOU:Department of Mechanical and Mechatronic Engineering|
|Keywords: ||Bias voltage;CrTaN;Oxidation|
|Issue Date: ||2013-10-07T02:07:56Z
|Publisher: ||Thin Solid Films|
|Abstract: ||CrTaN coatings were fabricated using reactive direct current magnetron co-sputtering on a Ti interlayer covering silicon substrates with various bias voltages. The CrTaN coatings were annealed at 600 °C for 4–24 h under a 50 ppm O2–N2 atmosphere, and the effectiveness of the fabricated layers as a protective coating for glass molding dies was assessed. The effects of biased voltage on the structure, mechanical properties, surface roughness values, and oxygen diffusion depths were investigated. The results indicated that the coating prepared with a bias voltage of − 25 V exhibited mechanical properties that were superior to those of the other coatings used in this study. In addition, these properties (including nanohardness, Young's modulus, and the derivative H3/E2 ratio) increase after annealing at 600 °C in a glass molding atmosphere (i.e., 50 ppm O2–N2 atmosphere, with a smoother surface characteristic).|
|Relation: ||544(1), pp.606–611|
|Appears in Collections:||[機械與機電工程學系] 期刊論文|
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