English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26994/38795
Visitors : 2387983      Online Users : 30
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/34231

Title: Thermal stability of CrTaN hard coatings prepared using biased direct current sputter deposition
Authors: Chen;Y.-I*;Lin;K.-Y.;Chou;C.-C.
周昭昌
Contributors: NTOU:Department of Mechanical and Mechatronic Engineering
國立臺灣海洋大學:機械與機電工程學系
Keywords: Bias voltage;CrTaN;Oxidation
Date: 2012-11
Issue Date: 2013-10-07T02:07:56Z
Publisher: Thin Solid Films
Abstract: CrTaN coatings were fabricated using reactive direct current magnetron co-sputtering on a Ti interlayer covering silicon substrates with various bias voltages. The CrTaN coatings were annealed at 600 °C for 4–24 h under a 50 ppm O2–N2 atmosphere, and the effectiveness of the fabricated layers as a protective coating for glass molding dies was assessed. The effects of biased voltage on the structure, mechanical properties, surface roughness values, and oxygen diffusion depths were investigated. The results indicated that the coating prepared with a bias voltage of − 25 V exhibited mechanical properties that were superior to those of the other coatings used in this study. In addition, these properties (including nanohardness, Young's modulus, and the derivative H3/E2 ratio) increase after annealing at 600 °C in a glass molding atmosphere (i.e., 50 ppm O2–N2 atmosphere, with a smoother surface characteristic).
Relation: 544(1), pp.606–611
URI: http://ntour.ntou.edu.tw/handle/987654321/34231
Appears in Collections:[機械與機電工程學系] 期刊論文

Files in This Item:

There are no files associated with this item.



All items in NTOUR are protected by copyright, with all rights reserved.

 


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback