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|Title: ||Effect of Focussed Vacuum Arc Plasma Deposition on the Properties of Tetrahedral Amorphous Carbon Films|
|Authors: ||DANIEL H. C. CHUA;K. B. K. TEO;T. H. TSAI;J. ROBERTSON;W. I. MILNE|
|Issue Date: ||2013-04-08T02:24:52Z
|Publisher: ||International Journal of Modern Physics B|
|Abstract: ||Abstract:We have investigated the effect of using a magnetic field to confine and focus the plasma in a Filtered Cathodic Vacuum Arc (FCVA) deposition system used for the preparation of tetrahedrally bonded amorphous carbon (ta-C) thin films. The design of the magnetic field is such that the plasma can be confined into a high-density focussed spot or de-focussed into a lower density wide beam. Increasing the magnetic field directly increases the plasma density and thus increases the deposition rate. The ta-C films grown in the magnetic field were subsequently characterised. EELS and Raman measurement were used to measure the sp3/sp2 ratio and UV-vis spectroscopy for optical bandgap studies. The intrinsic stress and I-V characteristics of the thin films were also studied. The results show that it is possible to deposit the films at rates as high as 2.5 nm/sec without adversely affecting the material properties.|
|Relation: ||16(6-7), pp.830|
|Appears in Collections:||[光電科學研究所] 期刊論文|
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