Abstract:This paper describes the work carried out to produce patterned arrays of multi-wall carbon nanotubes (MWCNTs) using a liquid catalyst and a microwave plasma technique. By this method we can control the CNT growth on selective sites by engineering the substrate surface and yet maintain a very high CNT growth rate (~10 μm per minute). The catalyst is made by hydrochloric acid solution which contains high concentration of ferromagnetic metal ions. Upon dispersing the liquid catalyst on a silicon nitride substrate containing exposed silicon patterns, the catalyst only precipitates on the hydrophilic sites (i.e. silicon surface). After performing the CNT growth in a microwave reactor with CH4/N2 mixture plasma, nanotubes can only be found to grow on exposed silicon surface instead of the main area covered by silicon nitride. This method allows us to produce multi-wall carbon nanotubes on the selective area as in the silicon trenches, concavities and thin film edges.