In this paper, we present an approach to coating the thin high work function (HWF, with qm in eV) films on an indium tin oxide (ITO)/ glass substrate. Thin HWF films are co-sputtered on an ITO using the vanadium (V+4-ion) dopant concentrations from 0% to 12.25%, and the qm-values are increased from 4.80 eV to 5.25 eV, respectively. The HWF-ITO deposition condition is developed for organic light-emitting device (OLED) applications. The electro-luminescence (EL) improvement, in particular the turn-on voltage from 7.7 V to 0.3 V, is well correlated with the work function change. The output luminance (in cd/m2) at 10-V driving voltage of the developed OLED is increased from 35K cd/m2 (at 5% V+4-ion concentrations) to 75K cd/m2 (at 5% V+4-ion concentrations). These EL results with the HWF-ITO film are well above the OLED application standard.