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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/28491

Title: Growth and characterization of vertically aligned 1D IrO2 nanocrystals via reactive sputtering
Authors: A.V. Korotcov;Y.S.Huang;D.S.Tsai;K.K.Tiong
Contributors: NTOU:Department of Electrical Engineering
國立臺灣海洋大學:電機工程學系
Date: 2005-07
Issue Date: 2011-10-21T02:37:46Z
Publisher: Proceedings of 2005 5th IEEE Conference on Nanotechnology Nagoya, Japan, July 2005
Abstract: Abstract:We report the preparation of 1D vertically aligned IrO2 nanocrystals on LiNbO3 (100) substrates by reactive magnetron sputtering with Ir metal target. The effects of sputtering conditions such as pressure, rf power, substrate temperature etc. have been presented and discussed. The surface morphology, structural and spectroscopic properties of the as-grown nanocrystals have been characterized using field-emission scanning electron microscopy (FESEM), X-ray diffractometry (XRD) and micro-Raman scattering. The red-shift and asymmetric broadening of Raman lineshape have been analyzed and attributed to both the size effect and residual stress.
URI: http://ntour.ntou.edu.tw/handle/987654321/28491
Appears in Collections:[電機工程學系] 演講及研討會

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