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|Title: ||Growth and Characterization of Well-Aligned RuO2 Nanocrystals on Oxide Substrates via Reactive Sputtering|
|Authors: ||Alexandru Korotcov;Hung-Pin Hsu;Ying-Sheng Huang;Dah-Shyang Tsai;Kwong-Kau Tiong|
|Contributors: ||NTOU:Department of Electrical Engineering|
|Issue Date: ||2011-10-21T02:37:45Z
|Publisher: ||Crystal Growth & Design|
|Abstract: ||Abstract:Well-aligned, densely packed RuO2 nanocrystals (NCs) have been grown on sapphire (SA), LiNbO3 (LNO), and
LiTaO3 (LTO) substrates with different orientations via reactive magnetron sputtering using a Ru metal target. The surface morphology
and structural and spectroscopic properties of the as-deposited NCs are characterized using field-emission scanning electron microscopy
(FESEM), X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), and micro-Raman spectroscopy (RS). FESEM
micrographs reveal that NCs grown on SA(100)/LNO(100) are vertically aligned, whereas the NCs on SA(012)/LTO(012) and
SA(110) contain singly and doubly tilted alignments, respectively, with a tilted angle of 35° from the normal to the substrates.
NCs grown on SA(001) show in-plane alignment with the mosaic structure. The XRD results indicate that the NCs are (001), (101),
and (100) oriented on SA(100)/LNO(100), SA(012)/LTO(012)/SA(110), and SA(001) substrates, respectively. A strong substrate
effect on the alignment of the RuO2 NCs deposition has been demonstrated. XPS analyses reveal the coexistence of higher oxidation
states of Ru in the as-deposited RuO2 NCs. The Raman spectra show the red-shift and asymmetric peak broadening of the RuO2
signatures with respect to that of the bulk counterpart, which are attributed to both the size and residual stress effects, whereas the
intensity of certain modes follows the selection rules for the different oriented NCs.
|Relation: ||6(11), pp.2501-2506|
|Appears in Collections:||[電機工程學系] 期刊論文|
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