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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/27732

Title: Generally Applicable Self-masking Technique for Nanotips Array Fabrication
Authors: KUEI-HSIEN CHEN;CHIH-HSUN HSU;HUNG-CHUN LO;SUROJIT CHATTOPADHYAY;CHIEN TING WU;JIH-SHANG HWANG;YING-JAY YANG;LI-CHYONG CHEN
Contributors: NTOU:Institute of Optoelectronic Sciences
國立臺灣海洋大學:光電科學研究所
Keywords: Nanostructure;electron cyclotron resonance;chemical vapor deposition;field emission;surface-enhanced Raman spectroscopy
Date: 2005
Issue Date: 2011-10-21T02:33:16Z
Publisher: International Journal of Nanoscience
Abstract: Abstract:Well-aligned nanotip arrays were fabricated via a self-masking dry etching technique in an electron cyclotron resonance (ECR) plasma process. Nanotip arrays of Si, poly silicon, GaN, GaP, sapphire, and Al were fabricated. Simultaneous etching of the substrate and formation of silicon carbide (SiC) protecting caps are attributed to the nanotip formation. The ultra-low turn-on field for electron field emission as well as the surface enhanced Raman Spectroscopic study of Si nanotips is also demonstrated.
Relation: 4(5-6), pp.879-886
URI: http://ntour.ntou.edu.tw/handle/987654321/27732
Appears in Collections:[光電科學研究所] 期刊論文

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