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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/27582

Title: Direct patterning of zinc oxide with control of reflected color through nano-oxidation using an atomic force microscope
Authors: J. S. Hwang;L. W. Chen;T. C. Chen;C. W. Kuo;Z. S. Hu;T. R. Tsai;Y. J. Wu;T. Y. Lin;Y. Y. Jhuo;C. Y. Chen;C. M. Lin;Y. H. Liu
Contributors: NTOU:Institute of Optoelectronic Sciences
國立臺灣海洋大學:光電科學研究所
Date: 2009-02-04
Issue Date: 2011-10-21T02:32:13Z
Publisher: Nanotechnology
Abstract: Abstract:Atomic force microscope oxidation on Zn creating amorphous ZnO (a-ZnO) with the a-ZnO showing multiple colors under white light at different oxidation voltages was successfully demonstrated. Simulation of reflected colors at different thicknesses of a-ZnO was also conducted. The presented technique can not only be applied to near diffraction limit multilevel optical data storage, but also makes it possible to represent the color spectra observed in nature at near diffraction limits. It can also be used for device fabrication in situations exploiting the semiconductor nature of ZnO.
Relation: 20(5), pp.055302
URI: http://ntour.ntou.edu.tw/handle/987654321/27582
Appears in Collections:[光電科學研究所] 期刊論文

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