English  |  正體中文  |  简体中文  |  Items with full text/Total items : 26988/38789
Visitors : 2325208      Online Users : 54
RC Version 4.0 © Powered By DSPACE, MIT. Enhanced by NTU Library IR team.
Scope Adv. Search
LoginUploadHelpAboutAdminister

Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/27579

Title: Self- limiting growth of ZnO films on (0001) sapphire substrates by atomic layer deposition at low temperatures using diethyl-zinc and nitrous oxide
Authors: Yen-Ting Lin;Ping-Han Chung;Hung-Wei Lai;Hsin-Lun Su;Dong-Yuan Lyu;Kuo-Yi Yen;Tai-Yuan Lin;Chung-Yuan Kung;Jyh-Rong Gong
Contributors: NTOU:Institute of Optoelectronic Sciences
國立臺灣海洋大學:光電科學研究所
Keywords: ZnO;Atomic layer deposition;Absorption spectroscopy
Date: 2009-11-15
Issue Date: 2011-10-21T02:32:13Z
Publisher: Applied Surface Science
Abstract: Abstract:Atomic layer deposition (ALD) of zinc oxide (ZnO) films on (0 0 0 1) sapphire substrates was conducted at low temperatures by using diethyl-zinc (DEZn) and nitrous oxide (N2O) as precursors. It was found that a monolayer-by-monolayer growth regime occurred at 300 °C in a range of DEZn flow rates from 5.7 to 8.7 μmol/min. Furthermore, the temperature self-limiting process window for the ALD-grown ZnO films was also observed ranging from 290 to 310 °C. A deposition mechanism is proposed to explain how saturated growth of ZnO is achieved by using DEZn and N2O. Transmission spectroscopic studies of the ZnO films prepared in the self-limiting regime show that the transmittances of ZnO films are as high as 80% in visible and near infrared spectra. Experimental results indicate that ZnO films with high optical quality can be achieved by ALD at low temperatures using DEZn and N2O precursors.
Relation: 256(3), pp.819-822
URI: http://ntour.ntou.edu.tw/handle/987654321/27579
Appears in Collections:[光電科學研究所] 期刊論文

Files in This Item:

There are no files associated with this item.



All items in NTOUR are protected by copyright, with all rights reserved.

 


著作權政策宣告: 本網站之內容為國立臺灣海洋大學所收錄之機構典藏,無償提供學術研究與公眾教育等公益性使用,請合理使用本網站之內容,以尊重著作權人之權益。
網站維護: 海大圖資處 圖書系統組
DSpace Software Copyright © 2002-2004  MIT &  Hewlett-Packard  /   Enhanced by   NTU Library IR team Copyright ©   - Feedback