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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/27537

Title: Photo-assisted Local Oxidation of GaN Using an Atomic Force Microscope
Authors: Jih Shang Hwang;Zhan Shuo Hu;TonYuan Lu;Li Wei Chen;ShiWei Chen;Tai Yuan Lin;Ching-Lien Hsiao;Kuei-Hsien Chen;Li-Chyong Chen
Contributors: NTOU:Institute of Optoelectronic Sciences
國立臺灣海洋大學:光電科學研究所
Keywords: Electronics and devices;Condensed matter: electrical;magnetic and optical;Semiconductors;Surfaces;interfaces and thin films;Nanoscale science and low-D systems
Date: 2006-07-14
Issue Date: 2011-10-21T02:32:05Z
Publisher: Nanotechnology
Abstract: Abstract:This paper introduces a photo-assisted atomic force microscope (AFM) local oxidation technique which is capable of producing highly smooth oxide patterns with heights reaching several tens of nanometres on both n- and p-types of GaN (and in principle on most semiconductors) without the use of chemicals. The novel methodology relies on UV illumination of the surface of the substrate during conventional AFM local oxidation. A low 1.2 V threshold voltage for n-type GaN was obtained, which can be explained by UV photo-generation of excess electron–hole pairs in the substrate near the junction, thereby reducing the electric field required to drive carrier flow through the tip–sample Schottky barrier. It was demonstrated that the presence or absence of light alone was sufficient to switch the growth of the oxide on or off. The photo-assisted AFM oxidation technique is of immediate interest to the semiconductor industry for the fabrication of GaN-based complementary metal–oxide–semiconductor devices and nanodevices, improves chances for AFM-type data storage, and presents new degrees of freedom for process control technique.
Relation: 17(14), pp.3299-3303
URI: http://ntour.ntou.edu.tw/handle/987654321/27537
Appears in Collections:[光電科學研究所] 期刊論文

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