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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/23832

Title: Study of aluminum film deposition on the surface of micro-trench by dual ion beam sputtering
Authors: Hung-Yin Tsai;Kei-Lin Kuo;Chih-Wei Wu
Contributors: NTOU:Department of Mechanical and Mechatronic Engineering
國立臺灣海洋大學:機械與機電工程學系
Date: 2007-11
Issue Date: 2011-10-20T08:08:24Z
Publisher: Microprocesses and Nanotechnology, 2007 Digest of papers
Abstract: Abstract:In this study, dual ion beam sputtering were firstly used to deposit film on the surface of micro-trenches. Aluminum thin films were deposited on silicon substrates with micro-trenches of high aspect ratio. From the results, the dual ion beam system shows good step coverage and uniformity of film on the micro-trench.
Relation: pp.180-181
URI: http://ntour.ntou.edu.tw/handle/987654321/23832
Appears in Collections:[機械與機電工程學系] 期刊論文

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