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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/23734

Title: Annealing and oxidation study of Ta–Ru hard coatings
Authors: Yung-I Chen;Bin-Nan Tsai
Contributors: NTOU:Institute of Materials Engineering
國立臺灣海洋大學:材料工程研究所
Keywords: Ta–Ru;Intermetallic compounds;Oxidation;Glass molding
Date: 2010-11-25
Issue Date: 2011-10-20T08:07:38Z
Publisher: Surface and Coatings Technology
Abstract: Abstract:Refractory metal alloy coatings have been widely used as protective coatings on glass molding dies. The formation of intermetallic compounds in the coatings inhibits grain growth at high-temperature environment in the mass production of optical components. The current work presents Ta–Rucoatings with a Cr interlayer on cemented carbide substrates and silicon wafers deposited by direct current magnetron co-sputtering at 400 °C. The as-deposited Ta–Rucoatings possessed a hardness of 13–14 GPa and a surface roughness of 1.3–4.0 nm. The annealing treatments were carried out at 600 °C under two vacuum levels of 3 × 10− 3 and 3 Pa, respectively. After annealing in vacuum at 3 × 10− 3 Pa, the Ta–Rucoatings showed grain size, hardness, surface roughness and phase stability comparable to those of the as-deposited coatings. While annealing in vacuum at 3 Pa, preferential oxidation of Ta in the Ta–Rucoatings was verified by X-ray photoelectron spectroscopy, a variation of the chemical composition in depth was analyzed by Auger electron spectroscopy and the internal oxidation zone consisting of a laminated structure was observed by transmission electron microscopy.
Relation: 205(5), pp.1362-1367
URI: http://ntour.ntou.edu.tw/handle/987654321/23734
Appears in Collections:[材料工程研究所] 期刊論文

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