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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/23553

Title: Internal oxidation of Mo–Ru coatings
Authors: Yung-I Chen;Li-Chun Chang;Rong-Tan Huang;Bing-Nan Tsai;Yu-Chu Kuo
Contributors: NTOU:Institute of Materials Engineering
Keywords: Annealing;Sputtering;Oxidation;Mo–Ru;Phase separation;Scanning electron microscopy;Surface roughness;Auger electron spectroscopy
Date: 2010-05-03
Issue Date: 2011-10-20T08:06:35Z
Publisher: Thin Solid Films
Abstract: Abstract:The current experiment deposits Mo–Ru coatings with a Ti interlayer on silicon wafers by sputtering at 400 °C. The annealing treatments were conducted at 600 °C under atmospheres consisting of controlled oxygen contents with balanced nitrogen. After annealing in a 10 ppm O2–N2 atmosphere, surface roughness increased, apparently due to the formation of external island oxides. While annealing in a 220 ppm O2–N2 atmosphere, the relatively smooth surface was accompanied by the internal oxidation zone consisting of alternated oxygen rich and deficient layers.
Relation: 518(14), pp.3819-3824
URI: http://ntour.ntou.edu.tw/handle/987654321/23553
Appears in Collections:[材料工程研究所] 期刊論文

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