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Please use this identifier to cite or link to this item: http://ntour.ntou.edu.tw:8080/ir/handle/987654321/23522

Title: Hardness Enhancement in Nanocrystalline Tantalum Thin Films
Authors: M. Zhang;B. Yang;J. P. Chu;T. G. Nieh
Contributors: NTOU:Institute of Materials Engineering
國立臺灣海洋大學:材料工程研究所
Keywords: Nanocrystalline tantalum;Nanoindentation;Hardness;Thin films;Sputtering
Date: 2006-04
Issue Date: 2011-10-20T08:06:30Z
Publisher: Scripta Materialia
Abstract: Abstract:Nanocrystalline tantalum thin film was prepared by radio frequency magnetron sputtering on a glass substrate. The structure and mechanical properties of the as-deposited thin film were investigated by X-ray diffraction, transmission electron microscopy, and nanoindentation. The salient feature in the present tantalum thin film with a grain size of 76.5 nm is the remarkable enhancement of hardness, being about one order of magnitude higher than that of bulk coarse-grained tantalum.
Relation: 54(7), pp.1227-1230
URI: http://ntour.ntou.edu.tw/handle/987654321/23522
Appears in Collections:[材料工程研究所] 期刊論文

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